Research Areas

Our lab explores the cutting edge of photonics and lithography, focusing on three main pillars of research.

01

Meta-Optics Element Augmented Reality (AR) Waveguides

Design and fabrication of advanced diffractive optical elements using metasurfaces to enhance the field of view and efficiency of AR display systems.

02

Resolution Enhancement Technique

Developing computational lithography algorithms, including Source-Mask Optimization (SMO) and OPC, to push the limits of semiconductor manufacturing for ArF and EUV systems.

03

Quantum Annealing

Applying quantum computing paradigms to solve complex optimization problems in inverse lithography and mask synthesis, achieving faster convergence and better pattern fidelity.